We invite you to submit your papers now for CSTIC 2016, one of the largest and the most comprehensive annual semiconductor technology conferences in China. CSTIC is organized by SEMI and IEEE, co-organized by China's High-Tech Expert Committee (CHTEC). It is co-sponsored by ECS, MRS and China Electronics Materials Industry Association. CSTIC 2016 will be held on March 13-14, 2016 at the SHICC, Shanghai, China, in conjunction with SEMICON China 2016. It will cover all the aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, manufacturing as well as emerging semiconductor technologies and silicon material applications. Hot topics, such as 3D integration, III-V semiconductors, carbon nanoelectronics, LEDs, and MEMS.
We are soliciting papers from authors around the world on all aspects of semiconductor and photovoltaic technology and manufacturing, including semiconductor design, Frond-End-of-Line (FEOL), Back-End-of-Line (BEOL), packaging, testing, as well as emerging semiconductor technologies; photovoltaic market, policy, power grid, device, design, process, tooling, materials, and fundamental study between China and the rest of the world with a focus on industrial applications.
Topics to be addressed at CSTIC 2016 include, but are not limited to, the following:
Symposium I: Design Engineering and Technology
Symposium II: Lithography and Patterning
Symposium III: Dry & Wet Etch and Cleaning
Symposium IV: Thin Film Technology
Symposium V: CMP, Wafer Substrate Polishing and Post-Polish Cleaning
Symposium VI: Materials and Process Integration for Device and Interconnection
Symposium VII: Packaging and Assembly
(CPMT APM Joint Symposium)
Symposium VIII: Metrology, Reliability and Testing
Symposium IX: Emerging Semiconductor Technologies
Symposium X: Advances in MEMS and Sensor Technologies
Symposium XI: Circuit Design, System Integration and Applications
Sympoisum XII : Si Materials and Photovoltaic
Abstract Template Download
Prospective authors are requested to submit an abstract (Max. of 1000 words) by September 30th 2015.The abstract must clearly describe the nature, scope, content, organization, key points and significance of the proposed paper, using the templates on the CSTIC website.
Accepted papers notification:
All abstracts will be reviewed by CSTIC committees. Accepted papers will be notified no later than October 15th 2015.
Manuscripts of accepted papers which should be maximum 3 pages for contributed papers and maximum 4 pages in length for invited and keynote papers, including diagrams, figures, and photographs, are to be submitted using the template on the website.
The deadline for manuscript submittal is December 26, 2015.
English oral presentation materials are required by February 20, 2016.
Presentations are to be original, non-commercial in that they focus on the technical merits of a design, a method, a structure, an integration scheme, a material or a process rather than on the individual company¡¯ s products and their benefits.
Outstanding papers will be recommended for publication in a peer-reviewed, reputable international journal. Full length manuscripts of accepted papers will be considered for publication in IEEE Xplore.
CSTIC will have the following awards during the conferences to recognize outstanding scientific and/or engineering work in fundamental or applied semiconductor technologies by any authors in the world, particularly in China:
ECS Best Student Paper Awards
SEMI Best Young Engineer Paper Awards
CSTIC Best Poster Awards
We welcome your participation!
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