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摘要 / Abstract | ||||||||||||
High temperature, high power wideband gap semiconductors demand mastering the crystal growth process of materials like Silicon Carbide (SiC) and Gallium Nitride (GaN). Today, SiC is grown from a gas or liquid phase process that involves the following: the generation of reactants, the transport of reactants to the growth surface, adsorption at the growth surface, nucleation and finally crystal growth. In this talk the different SiC crystal growth processes and recent advancements in SiC technology will be discussed.
In the case of Silicon Carbide, the solid phase coexists in equilibrium with its gaseous phase and hence it sublimes before it melts. As a result, since there is no stoichiometric SiC liquid phase, it is impossible to employ congruent melt growth and therefore it is not possible to grow SiC single crystals from melt, and instead crystal growth from the vapor phase is the preferable technique for growing SiC crystals at a commercial scale. The Lely method was the first to grow SiC crystals of different polytypes of sufficient quality for electronic applications. The modified Lely method or physical vapor transport method (PVT) opened the way to industrialization of SiC and today SiC crystals of diameter up to 200 mm are grown using induction or resistance heated sublimation furnaces. The need for further improvements of quality and control of growth led to additional advances of the PVT process as well as the exploration of other viable options. The principle of gaseous cracking for the supply of Si and C was further developed in order to achieve growth rates comparable to the PVT method for the production of high volume wafers. The technique developed is called high temperature chemical vapor deposition (HT-CVD). Further concepts were presented such as the Halide CVD (H-CVD), Modified PVT (M-PVT) and a combination of HT-CVD and PVT reactor called Continuous Feed PVT (CF-PVT). However, the latter techniques are far from producing commercial scale SiC wafers and are currently used at an academic level. Lastly, in recent years, the growth of SiC bulk material from solution has gained interest from many researchers, as a potential method for producing large size, high quality SiC wafers, but is not a mature method capable of achieving commercialization status. GT Advanced Technologies is a diversified technology company with crystalline growth expertise in silicon, silicon carbide and sapphire. The company’s advanced materials deliver sustained value to the world’s top manufacturers in the global PV, power electronics and photonics markets. Leveraging its deep expertise in crystal growth technologies, GT Advanced Technologies has been involved in the development of commercial scale silicon carbide boule production to address the growing needs of the power electronics industry since the early 2000’s. The company’s extensive thermal modeling experience combined with equipment design has enabled unique production processes resulting in high quality boules with low crystalline defects and commercial run to run reproducibility. |
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